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   TO:         I4235700 IBMMAIL   IBM Mail exchange

   FROM:       DWALLACE EX2       D.Wallace        - Process Control Mngr Dunsdale

   DATE:       20 February 1997
   SUBJECT:    Collimation or not?

    I am interested in some user input regarding collimated light
    source exposure units for imaging multilayer innerlayers.
    Currently, we use ORC (Japan) point light source units in
    combination with a glass to glass vacuumed print frame and we are
    able to achieve very acceptable yields on 100 micron track / gap
    technology. We wish to improve this capability down to 50 micron
    track / gap. Is collimation the only practical way of achieving
    this? Are there any other benefits in using this type of light
    source? What, if any, are the drawbacks?

    Thanks in advance for any imput.

    David H Wallace Process Control Manager Exacta Circuits Limited.

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