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TO: I4235700 IBMMAIL IBM Mail exchange
FROM: DWALLACE EX2 D.Wallace - Process Control Mngr Dunsdale
DATE: 20 February 1997
SUBJECT: Collimation or not?
I am interested in some user input regarding collimated light
source exposure units for imaging multilayer innerlayers.
Currently, we use ORC (Japan) point light source units in
combination with a glass to glass vacuumed print frame and we are
able to achieve very acceptable yields on 100 micron track / gap
technology. We wish to improve this capability down to 50 micron
track / gap. Is collimation the only practical way of achieving
this? Are there any other benefits in using this type of light
source? What, if any, are the drawbacks?
Thanks in advance for any imput.
David H Wallace Process Control Manager Exacta Circuits Limited.
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