\0 TO: I4235700 IBMMAIL IBM Mail exchange FROM: DWALLACE EX2 D.Wallace - Process Control Mngr Dunsdale DATE: 20 February 1997 SUBJECT: Collimation or not? I am interested in some user input regarding collimated light source exposure units for imaging multilayer innerlayers. Currently, we use ORC (Japan) point light source units in combination with a glass to glass vacuumed print frame and we are able to achieve very acceptable yields on 100 micron track / gap technology. We wish to improve this capability down to 50 micron track / gap. Is collimation the only practical way of achieving this? Are there any other benefits in using this type of light source? What, if any, are the drawbacks? Thanks in advance for any imput. David H Wallace Process Control Manager Exacta Circuits Limited. *************************************************************************** * TechNet mail list is provided as a service by IPC using SmartList v3.05 * *************************************************************************** * To subscribe/unsubscribe send a message <to: [log in to unmask]> * * with <subject: subscribe/unsubscribe> and no text in the body. * *************************************************************************** * If you are having a problem with the IPC TechNet forum please contact * * Dmitriy Sklyar at 847-509-9700 ext. 311 or email at [log in to unmask] * ***************************************************************************