Good Morning TechNet!
     
     I would like to submit a question to the forum members using 
     No-clean/Low-residue fluxes.  Are any of you using flux marking pens 
     to identify defects?  If so, how are you removing the flux from the 
     marking pen?  My delimena, I think, is, if I am in the process of 
     removing inline cleaners by moving to No-clean/Low-residue fluxes, 
     yet, I use a RMA type flux pen to mark a defect that will need to be 
     cleaned off, then it would seem I am defeating my purpose of 
     No-clean/Low-residue flux transition.
     
     Has anyone any experience on this?  Can you leave the marks on the 
     CCA?  If so do you have any data to show no electromigration/dendritic 
     growth/fungus growth or problems long term from Hallides ...etc...?
     
     I would appreciate some discussion since I know there is quite a bit 
     of valuable experience out there in cyberspace.
     
     Thanks in advance for your inputs.  
     
     Ron Hollandsworth
     [log in to unmask]
     IR&D Operations Task Leader
     ITT Aerospace/Communication Division

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