Good Morning TechNet! I would like to submit a question to the forum members using No-clean/Low-residue fluxes. Are any of you using flux marking pens to identify defects? If so, how are you removing the flux from the marking pen? My delimena, I think, is, if I am in the process of removing inline cleaners by moving to No-clean/Low-residue fluxes, yet, I use a RMA type flux pen to mark a defect that will need to be cleaned off, then it would seem I am defeating my purpose of No-clean/Low-residue flux transition. Has anyone any experience on this? Can you leave the marks on the CCA? If so do you have any data to show no electromigration/dendritic growth/fungus growth or problems long term from Hallides ...etc...? I would appreciate some discussion since I know there is quite a bit of valuable experience out there in cyberspace. Thanks in advance for your inputs. Ron Hollandsworth [log in to unmask] IR&D Operations Task Leader ITT Aerospace/Communication Division *************************************************************************** * TechNet mail list is provided as a service by IPC using SmartList v3.05 * *************************************************************************** * To unsubscribe from this list at any time, send a message to: * * [log in to unmask] with <subject: unsubscribe> and no text. * *************************************************************************** * If you are having a problem with the IPC TechNet forum please contact * * Dmitriy Sklyar at 847-509-9700 ext. 311 or email at [log in to unmask] * ***************************************************************************