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July 1998

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Subject:
From:
"Nelson, John" <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Wed, 22 Jul 1998 08:04:39 -0400
Content-Type:
text/plain
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text/plain (34 lines)
Dear Whatever,

We have an I.S. machine that has the normal three counterflowing water
rinses followed by
an extra section with an acid chamber and two following water rinses.
We use 5% Sulfuric
not so much to stop the dry film developing so much as to cut the
chromates on double
treat copper so it will etch faster and more uniformly.  It doesn't work
as well as planned
because the IS is all stainless steel so we are limited to how strong th
eacid can be.  If we
had a plastic module then we could use HCl and really rock & roll.

We do no analysis.  The bath gets nasty from resist drag-in so we just
dump it daily.

Regarding double laminators, we have heard of it but not tried it.  You
may want to contact
Maintech Inc.(215)289-7861.  They are importers and sometimes
manufacturers of fine machines.

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