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April 2012

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Subject:
From:
Dwight Mattix <[log in to unmask]>
Reply To:
TechNet E-Mail Forum <[log in to unmask]>, Dwight Mattix <[log in to unmask]>
Date:
Fri, 13 Apr 2012 09:26:56 -0700
Content-Type:
text/plain
Parts/Attachments:
text/plain (200 lines)
"You can't make it so Paul can't break it."  ;-)


At 01:04 PM 4/12/2012, Paul Reid wrote:
>Hi Denny,
>
>
>
>This was a layer1/2 microvia that is supposed to be copper filled with a
>cap layer also. The microvia is on a buried via I believe but I don't
>remember It could be on another microvia. The section is to the center
>of the microvia.
>
>
>
>What we did was we preformed an IST test and this microvia failed in 19
>cycles. The failure is a 10% increase in resistance.
>
>
>
>Sincerely,
>
>
>
>Paul Reid
>
>Program Coordinator
>
>PWB Interconnect Solutions Inc.
>235 Stafford Rd., West, Unit 103
>Nepean, Ontario Canada, K2H 9C1
>
>613 596 4244 ext. 229
>
>Skype paul_reid_pwb
>[log in to unmask]
>
>
>
>________________________________
>
>From: Dennis Fritz [mailto:[log in to unmask]]
>Sent: April 12, 2012 1:53 PM
>To: [log in to unmask]; Paul Reid
>Subject: Re: [TN] Micro Stacked Via, solid copper plating, voiding
>
>
>
>Paul,
>
>
>
>I am having a bit of a problem understanding what this construction was.
>Obviously layer 1 to layer 2.  But there seems to have been some cap
>plating at layer 2.  Also, the microvias seem an a very high aspect
>ratio.   They surely were sectioned to the center of the microvia?   Did
>the cracks you point out show up as opens or intermittents?  You must
>have cycled these to be sectioning them, surely those are not knit lines
>from copper plating.
>
>
>
>Guess a little background on these would help the analysis. Thanks -
>Denny Fritz
>
>
>
>         -----Original Message-----
>         From: Steve Gregory <[log in to unmask]>
>         To: TechNet <[log in to unmask]>
>         Sent: Thu, Apr 12, 2012 9:04 am
>         Subject: Re: [TN] Micro Stacked Via, solid copper plating,
>voiding
>
>Hi Paul!
>
>
>Sorry I didn't get your photos posted yesterday, got rather busy
>yesterday,
>but I have them posted now:
>
>http://stevezeva.homestead.com/MV_Void_with_Barrel_Crack_01.jpg
>
>http://stevezeva.homestead.com/MV_Void_with_Barrel_Crack_02.jpg
>
>http://stevezeva.homestead.com/MV_Void_with_Barrel_Crack_03.jpg
>
>http://stevezeva.homestead.com/MV_Void_with_Barrel_Crack_06.jpg
>
>http://stevezeva.homestead.com/MV_Void_with_Crystal_01.jpg
>
>http://stevezeva.homestead.com/MV_Void_with_Crystal_02.jpg
>
>Steve
>
>-----Original Message-----
>From: Paul Reid [mailto:[log in to unmask]
><mailto:[log in to unmask]> ]
>Sent: Wednesday, April 11, 2012 3:06 PM
>To: TechNet E-Mail Forum; [log in to unmask]
>Subject: RE: [TN] Micro Stacked Via, solid copper plating, voiding
>
>Hi Victor,
>
>I do not know that this is covered by IPC documents or not but I know
>that
>it can be a problem.
>
>Microvia voids have typically been acceptable if you do not violate the
>minimum thickness requirement of the copper in the barrel of the hole.
>
>What we have is an enclosed void that has plating solution in the void
>by
>default. The void cannot be plating closed without solution being
>trapped in
>the void. This makes the void very susceptible to conductive anodic
>filament
>(CAF) type of failure if there is a crack the goes to the void. I spent
>years looking for that crack and finally found one.
>Most voids do not produce a crack but on two occasions I have found
>cracks
>into voided microvias.
>
>It is why I suggest that voids be avoided in any high end application.
>It is not a standard but it is my take on this problem. Voids in plated
>closed microvias should not be allowed is my suggestion to the 6012
>committee.
>
>I have sent pictures to Steve Gregory to post on his web site. You'll
>note
>the plated closed microvias voids with cracks in the barrel on the
>microvia.
>In two pictures you will see a blue crystal that is still in the
>microvia
>that is from the plating solution. It is rare to find the blue crystal
>because microsectioning flushes out the blue crystals during processing.
>
>Sincerely,
>
>
>
>Paul Reid
>
>Program Coordinator
>
>PWB Interconnect Solutions Inc.
>235 Stafford Rd., West, Unit 103
>Nepean, Ontario Canada, K2H 9C1
>
>613 596 4244 ext. 229
>
>Skype paul_reid_pwb
>[log in to unmask]
>
>
>
>-----Original Message-----
>From: TechNet [mailto:[log in to unmask] <mailto:[log in to unmask]> ] On
>Behalf Of Victor Hernandez
>Sent: April 11, 2012 11:14 AM
>To: [log in to unmask]
>Subject: [TN] Micro Stacked Via, solid copper plating, voiding
>
>Fellow TechNetters:
>
>    I have searched for IPC documentation and/or Inductry Standards
>concerning the acceptance/guidelines for solid plated micro via voidibg.
>I did not locate any.  Can someone confirm that and/or provided guidance
>as
>to which document covers that anomaly.
>
>Victor,
>
>
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