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March 2000

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Subject:
Invitation to Photoresist Developing Discussion Group at Expo
From:
Christopher Jorgensen <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Wed, 15 Mar 2000 11:01:22 -0600
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The IPC Imaging/Developing Subcommittee (4-13) has organized a discussion group
during the Spring IPC EXPO in San Diego on "Developing Photoresists for Fine Line Applications". 

We welcome all PCB manufacturers who wish to discuss photoresist developing.

The meeting will be an informal discussion with no presentations.  We have invited representatives from equipment manufacturers, and photoresist and developing chemistry vendors.  

The meeting is scheduled for Tuesday April 4 from 8:00 to 10:00AM.  The meeting location will be in the final program in the Committee Meeting section.  (The final program will be available at the IPC meeting.) 


G. Sidney Cox, Ph.D.
Chairman of the Imaging/Developing Subcommittee (4-13)

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