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From [log in to unmask] Wed Apr 23 17: |
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At 09:57 AM 4/12/97 -0500, you wrote:
>I am surprised to hear the exposure step has a correction to the degree you've implied. This is interesting to me. Would you consider sharing your finding with the net. I am interesting in what step you have found to be the best. You can express you data in % relative to the other
>steps in lieu of to the population tested. This way you don't have to share your internal yields with the world, I would like to run a correlative study of my own. We use Dynachem HG and GA resist. What do you use?
>
>Our studies have concluded that the major cause of short and opens are directly related to the method and frequency by the which the printers clean there phototool ( A/W ). In other words we only have problems when we find operators not wiping down there film. Another key finding is the cleanliness of the room.
>
>Ed Cosper
>
Yes.We found this corrilation when we conducted a DOE keeping all other parameters constant. Our earlier results with a moving light source increased either open or shorts when we increased or decreased step. But with collimated source we found 50 % reduction in shorts/seepage without increase in opens.Further trials are on to arrive at the best possible parameter. We use Dupont 9415 resist.We have kept all parameters like cleaning A/W,lamination parameter etc constant and we have taken the same partnumber for the trials.
somashekar
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