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From [log in to unmask] Tue Feb 11 08: |
53:18 1997 |
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Good Morning TechNet!
I would like to submit a question to the forum members using
No-clean/Low-residue fluxes. Are any of you using flux marking pens
to identify defects? If so, how are you removing the flux from the
marking pen? My delimena, I think, is, if I am in the process of
removing inline cleaners by moving to No-clean/Low-residue fluxes,
yet, I use a RMA type flux pen to mark a defect that will need to be
cleaned off, then it would seem I am defeating my purpose of
No-clean/Low-residue flux transition.
Has anyone any experience on this? Can you leave the marks on the
CCA? If so do you have any data to show no electromigration/dendritic
growth/fungus growth or problems long term from Hallides ...etc...?
I would appreciate some discussion since I know there is quite a bit
of valuable experience out there in cyberspace.
Thanks in advance for your inputs.
Ron Hollandsworth
[log in to unmask]
IR&D Operations Task Leader
ITT Aerospace/Communication Division
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