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Date: | Mon, 16 Jan 2012 11:51:32 -0600 |
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Vandervoort's Principles of metallography lists a 3% solution of H2O2. I use 25 ml NH4OH with 25 ml H2O and about 0.25 to 0.5 ml concentrated H2O2 and I get good results
Regards,
Andy
Andrew C. Giamis
Andrew Solutions
FMA / Reliability Engineer
40 Technology Drive,
Warren, NJ 07059
(908) 546-4686 [Office]
(908) 938-7945 [Cell]
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-----Original Message-----
From: TechNet [mailto:[log in to unmask]] On Behalf Of Victor Hernandez
Sent: Monday, January 16, 2012 12:21 PM
To: [log in to unmask]
Subject: [TN] Copper etchant, 1:1:1
Folks,
Is there a real chemist out there or someone very knowledgeable of etchants?
DI water 10ml
Ammonium Hydroxide 28.0 - 30.0% 10ml
Hydrogen Peroxide 35 10ML
Polish, 6, 3, & 1 micron
Final polish 0.05 Alumina suspension
3 -5 seconds, flush with water
Which of the two chemicals would I increase volume to get stronger delineation/demarcation region of plated copper. The process being equal will not yield the same etchant quality. The variable is the quality of overseas copper suppliers.
Victor,
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