Brian is exactly correct.  But you must remember if you are not  RINSING the 
saponifier correctly you are not removing the flux as well. The flux  will add 
to the level of corrosive and hygroscopic residue.  If saponifier  is left on 
it will be a easy removed if water can get to the area.  We find  with QFN 
and other low standoff devices that flux, saponifier and water are left  under 
these components and they cause performance problems such as leakage, and  
dendrite growth.  Many of today saponifiers are not as difficult to clean  as the 
original terpene D-limonene cleaners would take multiple rinses to  completely 
remove the material.  The residue left after cleaning if not  properly rinsed 
with clean water can cause leakage and corrosion problems. 
 
Terry Munson
Foresite
765-457-8095
 
 
In a message dated 5/6/2008 2:08:55 A.M. Eastern Daylight Time,  
[log in to unmask] writes:

I would  say you have a problem. Saponifier usually has, inter alia, two  
components, an amine and a surfactant. The amine, commonly  
monoethanolamine, is ionic and the surfactant is commonly an ethylene  
glycol or similar. The latter has a low vapour pressure and is  
hygroscopic (and this generally applies to all surfactants, even if the  
chemistry family is different. It can also form a matrix which can hold  
the amine in suspension, slowing down iôts evaporation.

The idea of  leaving hygroscopic residues is anathema to me. If they are 
mixed with an  ionic residue, it is double anathema.

IMHO, and in my experience,  saponifier cleaning MUST be followed, not by 
a simple rinse cycle, but by  a full wash and rinse cycle, exactly as if 
it were a water-soluble  flux.

Brian

- bogert wrote:
> May 5, 2008
> 
>  I have the following question:  If a saponifier is used with a DI  
> cleaning machine to clean PWAs and the cleaning does not remove all  
> traces of the saponifier, is there any concern, including sugsequent  
> exposure, to a humid environment?  Any technical reports on this  subject?
> 
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