HI I know that some of you out there are having excellant results using the Morton MX series photo resist for pattern plating. I am experimenting with this material and I to have resolved some remarkably small and difficult patterns. But I need some advise that the Morton rep's can't seem to give me. How do you guys strip this stuff. I use Alkastrip AQI in my stripper (Monoethanolamine) at 7% at 120 F. for the regular resist. I have tried raising the concentration to 10% and the temperature up to 132 F. and there is still resist. I tried 5 % NaOH at 125 F., this improved the situation but there is still some residual resist on these panels. I will appreciate any thoughts. Thanks in advance. Chuck Brummer Acuson (818) 734-4930 [log in to unmask] *************************************************************************** * TechNet mail list is provided as a service by IPC using SmartList v3.05 * *************************************************************************** * To unsubscribe from this list at any time, send a message to: * * [log in to unmask] with <subject: unsubscribe> and no text. * *************************************************************************** * If you are having a problem with the IPC TechNet forum please contact * * Dmitriy Sklyar at 847-509-9700 ext. 311 or email at [log in to unmask] * ***************************************************************************