Gents & ladies of TechNet, I would appreciate your assistance in a quick survey of pre-clean options prior to application of photoimageable soldermasks. If possible could you send me your answers to the following questions: 1) What preclean system are you currently using (e.g., pumice, silicon carbide brush, microetch)? 2) If microetch, what chemistry type (e.g., persulphate, ferric chloride, sulphuric/ peroxide, etc)? 3) Are there any plans to change the existing methods, and if so what are the drivers and what would you be changing to? Any responses would be gratefully received! Thanks in advance, David Albin --------------------------------------------------------------------------------- Technet Mail List provided as a free service by IPC using LISTSERV 1.8d To unsubscribe, send a message to [log in to unmask] with following text in the BODY (NOT the subject field): SIGNOFF Technet To temporarily halt delivery of Technet send the following message: SET Technet NOMAIL Search previous postings at: www.ipc.org > On-Line Resources & Databases > E-mail Archives Please visit IPC web site (http://www.ipc.org/html/forum.htm) for additional information, or contact Keach Sasamori at [log in to unmask] or 847-509-9700 ext.5315 ---------------------------------------------------------------------------------