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August 1999

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Subject:
From:
Mordechai Holtzman <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Sat, 14 Aug 1999 10:34:35 EDT
Content-Type:
text/plain
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Hi Everyone
I do not know if your question was about a type of resist or if it was about
resist lift
If it was about resist lift I will highly recommend you to look at Complex
Wave Form Periodic Reverse CWF-PR. You can work with much less then 1 ounce
per gallon concentration and at the same time speed the process both items
help you to eliminate resist lift usually we will work with a full water base
resist.
You can read more information on our web site wwwpulseplating.com
Our team involves Moti Holtzman   Stephan Menared and Robert Ruman.
It is been developed at this time but information will start coming in as
soon as 2 to 3 days.
If you like to discuss it feel free to call me at  954 984 5130
or 954 461 5881
I look forward to talk to you

Moti Holtzman

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