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March 1999

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Subject:
From:
Graham Naisbitt <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Tue, 23 Mar 1999 12:34:09 -0000
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text/plain (65 lines)
John

It would appear that no-one answered your question. So if it is not too
late...

How clean is clean is a great big topic. There was an interesting article in
the Feb 99 issue of Precision Cleaning magazine written by people at
Lockheed Martin that covers this subject well. This is a USA journal and if
you need details, ask me.

They basically found that with low stand-off components, you MUST use wash
chemistry to lower surface tension of the water to get it underneath AND
remove the contaminant. However, it involves power - (wash pressure) as well
as solvent power (wash chemistry).

Regards, Graham Naisbitt

[log in to unmask]

Concoat Ltd             Phone: +44 1276 691100
Alasan House          Fax:      +44 1276 691227
Albany Park
CAMBERLEY
GU15 2PL UK
-----Original Message-----
From: John Gulley <[log in to unmask]>
To: [log in to unmask] <[log in to unmask]>
Date: 12 March 1999 17:24
Subject: [TN] RF PCMCIAs and Cleanliness


>Address,
>
>We have an application where we are using OA Flux and Paste to process
>RF PCMCIAs.  The PCAs are thoroughly cleaned prior to test.  I'm still
>having test issues with RF PCMCIAs.
>
>If I remember correctly, I read an article that discussed cleanliness of
>PCAs that are RF.  If the PCA is not thoroughly cleaned, the organics
>will wreak havoc on the RF tests.  There are chemistries (saponifers)
>available that will reliable remove the excess organics and provide
>enough cleanliness to pass RF testing.
>
>CAN someone please provide some more light onto this issue or give me a
>direction to pursue, e.g., contacts.  Thanks.
>
>John
>
>
>
>
>

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