Johnathan: The DeForest book, "PHOTORESIST Materials and Processes" was
published by McGraw-Hill in 1975. It's a good book and covers a lot of
information; liquids, dry films, negative/positive resists, formulations, micro
electronics etc. Unfortunately it may have more information and in other areas
than you really need or require.Also after 25 years some of it is dated.
        You may be better off contacting your current supplier/manufacturer of
imaging materials and working with them. Their technical service people could
probably supply you with more information than you ever wanted and it would be
more directed to your application.
        I have a copy of the book in my reference file. If there was something
in particular you were looking for I could possibly copy it and send it to you.
William Deforest did work at Rockwell when writing the book, I'm sure they have
a copy of it somewhere. If not there's always the Library of Congress.

                                                Regards
                                                        Michael Barmuta
                                                        Staff Engineer
                                                        Fluke Corp.
                                                        Everett Wa.
                                                        425-356-6076


On Thu, 11 Mar 1999 00:14:48 -0800 <Jonathan C. Dominguez> wrote:

> From: <Jonathan C. Dominguez> <[log in to unmask]>
> Date: Thu, 11 Mar 1999 00:14:48 -0800
> Subject: [TN] PHOTORESIST BOOK
> To: [log in to unmask]
>
> >From :  Jonathan C. Dominguez <[log in to unmask]>
>
> Hey Guys,
>
> I am a technical process engineer for primary imaging.
>
> Is there somebody who could help me where I could find a book (title,
> author, publisher, web site) regarding photoresist?
>
> Someone recommend me to look for a book "PHOTORESIST" by William DeForest,
> does anybody know this book?
>
> Any inputs will be highly appreciated.
>
>
> Regards,
> Jonathan
>
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