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January 1999

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Subject:
From:
"Eltek Ltd. - Process Engineering" <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Tue, 26 Jan 1999 07:31:16 +0200
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text/plain
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Thornton ,
We ae using NaOH instead of KOH for years . The stripping solution ( ready
for use ) is being prepared from technical grade liquid NaOH ( 48% ) and
antifoam in automatic plant feeded from bulk storage tank .
Degree of oxidation depends mainly on temperatures and quality of rinsing .
On pattern plating line there is no drying prior to alkaline etching , just
air knife to remove excess of water . However , stripped particles are
bigger , than with KOH . By one hand , filtration is easier , but by the
second hand , more sensible to overplating .
Regards


At 12:28 26/01/99 +1300, you wrote:
>Does anyone know where I can access information detailing the differences
>between KOH and NaOH as used in a photoresist stripping line. We currently
>use KOH to strip prior to our alkaline etch. NaOH seems to be the preferred
>choice by most other companies. Is it a better product or just cheaper.
>
>Thanks in advance
>
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Edward Szpruch
Eltek Ltd - Israel   Tel :  972 - 3 - 9305050 , Fax : 972 - 3 - 9309581
Sgoola industrial Zone , POB 159 , 49101 Petah Tikva , Israel
e-mail :  [log in to unmask]

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