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Reply To: | TechNet E-Mail Forum. |
Date: | Tue, 26 Jan 1999 07:31:16 +0200 |
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Thornton ,
We ae using NaOH instead of KOH for years . The stripping solution ( ready
for use ) is being prepared from technical grade liquid NaOH ( 48% ) and
antifoam in automatic plant feeded from bulk storage tank .
Degree of oxidation depends mainly on temperatures and quality of rinsing .
On pattern plating line there is no drying prior to alkaline etching , just
air knife to remove excess of water . However , stripped particles are
bigger , than with KOH . By one hand , filtration is easier , but by the
second hand , more sensible to overplating .
Regards
At 12:28 26/01/99 +1300, you wrote:
>Does anyone know where I can access information detailing the differences
>between KOH and NaOH as used in a photoresist stripping line. We currently
>use KOH to strip prior to our alkaline etch. NaOH seems to be the preferred
>choice by most other companies. Is it a better product or just cheaper.
>
>Thanks in advance
>
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Edward Szpruch
Eltek Ltd - Israel Tel : 972 - 3 - 9305050 , Fax : 972 - 3 - 9309581
Sgoola industrial Zone , POB 159 , 49101 Petah Tikva , Israel
e-mail : [log in to unmask]
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Please visit IPC's web site (http://www.ipc.org) "On-Line Services" section for additional information.
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