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January 1999

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Subject:
Photoresist stripping chemicals
From:
Thornton White <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Tue, 26 Jan 1999 12:28:01 +1300
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Does anyone know where I can access information detailing the differences
between KOH and NaOH as used in a photoresist stripping line. We currently
use KOH to strip prior to our alkaline etch. NaOH seems to be the preferred
choice by most other companies. Is it a better product or just cheaper.

Thanks in advance

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