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September 1998

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Subject:
From:
Ted Stern <[log in to unmask]>
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Date:
Fri, 25 Sep 1998 09:00:54 -0700
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Dear Mr. Kurup:

I believe the applicability of pH control applied to automated resist
stripping is dependent upon the chemistry.  I have had success with some
types of resist strippers (typically formulations which employ a strong
bas) and failures with others.  Unlike developing, the speed and
performance of many resist stripper formulations appears dependent on
more variables than the pH; and it was observed changes in the pH were
not directly proportional to changes in other stripping factors, hence
control by pH alone proved insufficient.

Also, if you are free to share the information, I would be interested in
learning about your experience with conductivity control.

Regards,
Ted Stern

Lenny Kurup wrote:
>
> Hello Technetters,
>
> Anyone out there using pH control for automatic replenishment of resist
> stripping chemistry. Conductivity control works fine, but I wonder if
> anyone has been able to optimize pH control.
>
> Thanks for all anticipated responses.
>
> Lenny Kurup
> EMX Enterprises Ltd.
> 905-475-8000 ext 240.
>
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