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August 1998

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Subject:
From:
Ducas Patrick <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Mon, 24 Aug 1998 16:28:40 -0400
Content-Type:
text/plain
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text/plain (24 lines)
Hi!

We are looking for an alternative solvent to HCFCs that can be used (and
can performe) in vapor degreasing system. The solvent must be compatible
and clean properly the rosin based flux with low flux residue activity
(Alpha 615).

I'm interested to know about performance and other detail of any
suggested product. It would be very appreciated.

Thanks in advance

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