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August 1998

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Subject:
From:
Moti Holtzman <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Tue, 11 Aug 1998 17:59:17 EDT
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Dear Lisa        From       Moti Holtzman    Ph  954 346 7608  Fax 954 346
0817
     A.S.E.T. Inc  6574 N. State Rd 7 Suite 144 Coconut Creek Fl 33067

Subject  IPC Long Beach, CA March 1999  Paper - Complex Wave Form Pulse
The paper will discuss the progress of the current vectors in the plating tank
as the power progress from the anode area towards the cathode area. The
polarisation or conductivity fluctuation will be analyze, System plating
influence on the changes in metal participation at the cathodic area. The
complex wave form as a tool to get a micro and macro density current control,
division of section of the plating system as a study tool of metal migration
from the anode area to the cathode area and finally the connection between
chemistry system and complex wave form to get control of the surface to
surface and surface to hole control including in high aspect ratio.

Moti Holtzman

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