Hello all:

We are going to evaluate a new type of liquid applicable primary etch
resist. Unlike commonly used resists, this one swells in the developer
solution and requires a mild scrubbing action to be completely
removed. Moreover, it is detached as flakes, very much like in the
stripper.

My question to all: Is anyone aware of developing machine that can
scrub the resist off the panel and also remove the flakes to avoid
redeposition on the panel? Our search so far yielded nothing and we
suspect that we might need a custom built machine.

Thanks,

J. Sater





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