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April 1998

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Subject:
Source of Masks
From:
Paul Wilson <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Wed, 15 Apr 1998 05:40:02 -0400
Content-Type:
text/plain
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text/plain (24 lines) 
TN:

In a past experience, masks with very fine designs for imaging and development study were used to evaluate spin coated resists materials on silicon wafers.

Does anyone have a source of semiconductor imaging masks (used, outdated, partly broken, or new) that I might scavenge for good use?

Thank you in advance,

Paul G. Wilson
Plant Chemist
Circuit Center, Inc.

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