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March 1998

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Subject:
From:
SMITH RUSSELL MSM PO US <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Fri, 27 Mar 1998 02:16:00 +0100
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Charles the more energy you can impart in to the substrate the better
the resolution and sidewall configuration , especially when working with
Photovias. ( time is no substitute for intensity). I recommend an 8KW
minimum unit or one with as high a wattage at the  work as possible.
Determination of actual values is dependent on the meter used so If I
gave you a number I will not correlate to your radiometer.
        Don't be afraid of a chilled unit , control of the frame
temperature will give you more repeatable results.
        Lastly you are probably caught in the Collimation -Non
Collimation debate. Remember the finer the feature you can resolve the
finer the Particle you also resolve. so high resolution goes with
particulate free atmosphere and substrates.

Send me your Address and I can send you some more information

russell.smith @ cibasc.com
 ----------
From: Charles Busa
To: [log in to unmask]
Subject: [TN] Exposure units ?
Date: Wednesday, March 18, 1998 9:55PM

We are setting up a R & D facility which will be involved in
MCM-L fabrication and chip scale packaging techniques. Our
immediate concern is an Exposure unit capable of doing
.003" lines/spaces in resists .001 - .0015" thk., and also
capable of exposing .004" dia. vias in a photodefined dielectric.
    I would appreciate any recommendations regarding equipment
specifications and processing tips.

    NOTE: Speed of processing is not a requirement and I would
          like to stay away from the high power(7/8 kw) units
          that require chillers or some additional cooling scheme.

               Thank you for your consideration and time

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