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March 1998

TechNet@IPC.ORG

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David D Hillman <[log in to unmask]>
Date:
Mon, 9 Mar 1998 15:09:13 +0000
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"TechNet E-Mail Forum." <[log in to unmask]>, [log in to unmask]
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Jeremy Drake <[log in to unmask]>
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I can't remember the resistivity of the water thats typically
required, but a common practice is to use very pure, high
resistivity water, then use a CO2 bubbler to reduce resistivity
to a point where ESD to the wafer isn't a risk. The water jets
aimed at the cutting area can generate large electrostatic
charges. The dissolved CO2 reduces them to acceptable levels.



         The high purity of the water before CO2 gets rid of the nasty          stuff like Na+, Cl- etc.          J Drake          Celestica Ltd.

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