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February 1998

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Subject:
From:
"Kane, Joseph" <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Mon, 2 Feb 1998 09:51:16 -0500
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Anyone:

Question on double sided SMT, RMA paste.  After side 1 reflow, we plan
to semi-aqueous clean (followed by a short bake at 85C) before any work
on side 2.  Will the short exposure to DI water in the rinse phase lead
to any appreciable moisture uptake in PEM's?  Or does the mechanism
involve longer term exposure to atmospheric moisture?  We could test
samples, weighing before and after, but since the mix is considerable,
advice on whether this is necessary would be welcome.

Joe Kane
Lockheed Martin Control Systems

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