We received the following question at our company's web page.  We are
not familiar with this type of processing and are wondering if anyone on
TechNet may have a reasonable reply.

Thanks,
George Bokisa
McGean-Rohco

------- Forwarded Message Follows -------
From:          [log in to unmask]
To:            [log in to unmask]
Subject:       Etching TiW (Titanium/Tungsten) Films
Date:          Wed, 18 Feb 1998 17:20:26 -0500

We have been using 30% Hydrogen Peroxide to etch a thin Ti/W film.  The
film lies on top of a thin Polyimide film and the H2O2 is damaging the
polyimide.

1.  Can anyone suggest other chemicals that we can use to etch the Ti/W
film?

2.  Does anyone know of any "passivation" chemcal that might be used
after an H2O2 etch to
remove or neutralize the damage of H2O2 on the polyimide?

Thanks much!

################################################################
TechNet E-Mail Forum provided as a free service by IPC using LISTSERV 1.8c
################################################################
To subscribe/unsubscribe, send a message to [log in to unmask] with following text in the body:
To subscribe:   SUBSCRIBE TechNet <your full name>
To unsubscribe:   SIGNOFF TechNet 
################################################################
Please visit IPC web site (http://jefry.ipc.org/forum.htm) for additional information.
For the technical support contact Dmitriy Sklyar at [log in to unmask] or 847-509-9700 ext.311
################################################################