We received the following question at our company's web page. We are
not familiar with this type of processing and are wondering if anyone on
TechNet may have a reasonable reply.
Thanks,
George Bokisa
McGean-Rohco
------- Forwarded Message Follows -------
From: [log in to unmask]
To: [log in to unmask]
Subject: Etching TiW (Titanium/Tungsten) Films
Date: Wed, 18 Feb 1998 17:20:26 -0500
We have been using 30% Hydrogen Peroxide to etch a thin Ti/W film. The
film lies on top of a thin Polyimide film and the H2O2 is damaging the
polyimide.
1. Can anyone suggest other chemicals that we can use to etch the Ti/W
film?
2. Does anyone know of any "passivation" chemcal that might be used
after an H2O2 etch to
remove or neutralize the damage of H2O2 on the polyimide?
Thanks much!
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