Subject: | |
From: | |
Reply To: | TechNet Mail Forum. |
Date: | Thu, 22 Jan 1998 07:48:17 -0500 |
Content-Type: | text/plain |
Parts/Attachments: |
|
|
At 09:30 AM 1/22/98 PST, you wrote:
> Hi all,
>
> Our ammonia etcher is followed by a replenisher rinse consists of 4
> cascade rinse chambers. As I understand, all ammonia etchers are
> followed by some cinfiguration of replenisher rinse, and when I ask
> what is the purpose of it, I was told that the rep. rinse is to
> 1) Decrease the copper content in the subsequent rinse water
> 2) Increase the copper content in the etchant that enter the etcher
> 3) Give a finishing touch to the etched panels
>
> I understand point#1, but not #2 and 3. Why would one want to increase
> the copper concentration in incoming etchant? Won't that defeat the
> purpose of feeding "fresh" etchant? And how does rinsing in cold,
> fresh etchant give a finishing touch to the etched panels?
>
> Regards,
>
> Yee T.G.
> Hadco Corp.
The main reason for the cascade rinses is to reduce the copper in the rinse
water going to the waste treatment system. Any other benifits are a extra
benefit.
Ed
##############################################################
TechNet Mail List provided as a free service by IPC using LISTSERV 1.8c
##############################################################
To subscribe/unsubscribe, send a message to [log in to unmask] with following text in the body:
To subscribe: SUBSCRIBE TECHNET <your full name>
To unsubscribe: SIGNOFF TECHNET
##############################################################
Please visit IPC web site (http://www.ipc.org/html/forum.htm) for additional information.
For the technical support contact Dmitriy Sklyar at [log in to unmask] or 847-509-9700 ext.311
##############################################################
|
|
|