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Reply To: | TechNet E-Mail Forum. |
Date: | Sat, 24 Jan 1998 19:59:31 EST |
Content-Type: | text/plain |
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Brett,
I'm unclear at which point in the process you would like to extend hold times,
so I'll do my best to answer your question.
In general, reducing hold times during the image process is recommended.
Most dry film resists like an acidic surface, and this will usually promote
adhesion, and occasionally, cause lock-in.
Heating panels prior to lamination can help achieve better resist
conformation, but should not affect hold times under normal conditions. If
you are heating developed panels, again, lock-in is a possible result. Be
careful baking panels after developing; it is very easy to make the dry film
too brittle.
Hold times are generally determined by the resist formulation, and process
environment also has a big impact. Check with your supplier for
recommendations.
I hope this information is helpful.
Mark Dowding
Regional Technical Service Manager
INSULECTRO
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