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December 1997

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Subject:
Re: Under Develope of the Wet Film Solder Mask
From:
RSedlak <[log in to unmask]>
Reply To:
TechNet Mail Forum.
Date:
Mon, 8 Dec 1997 05:42:35 EST
Content-Type:
text/plain
Parts/Attachments:
text/plain (22 lines) 
We suspect that the problem you are seeing is pretty common, simply not seen,
or recognized by most people.   We developed an alkaline cleaner to remove
such residues, as we feel that they are, once in place, not removeable by a
developer.   If you want information, please contact me directly.

Rudy Sedlak
RD Chemical Company
Mountain View CA
fax +650-962-0370

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