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August 1997

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TechNet Mail Forum<[log in to unmask]>
Subject:
From:
Suixin Zhang <[log in to unmask]>
Date:
Thu, 21 Aug 1997 14:54:54 +0100
Comments:
Authenticated sender is <suixin@trappist>
Organization:
ELIS - TFCG/IMEC
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"TechNet Mail Forum." <[log in to unmask]>, Suixin Zhang <[log in to unmask]>
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Hello, everyone

I am setting up a spray etching bath using merely CuCl2.2H2O and HCl.
My questions are

1. What are the concentrations for CuCl2.2H2O (???g/l or
???lb/gallon) and HCl (???ml/l or ???gallon/gallon)?

2. What's the reading of redox potential of a fresh bath at room
temperature or at working temperature?

3. How fast is the etching rate using this kind of bath?

Any input will be highly appreciated
suixin zhang
ELIS-TFCG/IMEC, University of Ghent
Sint-Pietersnieuwstraat 41, B-9000 Ghent, Belgium
tel: 0032-9-2643371
fax: 0032-9-2643594
Email: [log in to unmask]


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