Curious as to what type of DOE?  Depending on the answer, I have several 
questions that might help me to better understand the results.  Could you 
give a little more detail on the DOE set up and the statistics from the 
results?

Thanks
 ----------
From: [log in to unmask]
To: [log in to unmask]
Cc: [log in to unmask]
Subject: RE: OPENS AND SHORTS
Date: Tuesday, April 22, 1997 5:41PM

At 09:57 AM 4/12/97 -0500, you wrote:
>I am surprised to hear the exposure step has a correction to the degree
you've implied. This is interesting to me. Would you consider sharing your
finding with the net. I am interesting in what step you have found to be the
best. You can express you data in % relative to the other >steps in lieu of 
to the population tested. This way you don't have to share
your internal yields with the world,  I would like to run a correlative 
study
of my own. We use Dynachem HG and GA resist. What do you use?
>
>Our studies have concluded that the major cause of short and opens are
directly related to the method and frequency by the which the printers clean
there phototool ( A/W ). In other words we only have problems when we find
operators not wiping down there film. Another key finding is the cleanliness
of the room. >
>Ed Cosper
>

Yes.We found this corrilation when we conducted a DOE keeping all other
parameters constant. Our earlier results with a moving light source 
increased
either open or shorts when we increased or decreased step. But with 
collimated
source we found 50 % reduction in shorts/seepage without increase in
opens.Further trials are on to arrive at the best possible parameter. We use
Dupont 9415 resist.We have kept all parameters like cleaning A/W,lamination
parameter etc constant and we have taken the same partnumber for the trials.

somashekar


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