Collimation is a must for the 50 micron features.  You can produce this pitch on
point source but if you want true repeatability or you have some variation in 
your photo tools you need the collimation.

Test Tamarack or Optical Radiation units.  

Tamaracks number is 714-632-5030, talk to Mike Moreau or Dan Klug,
I don't have Optical Radiations number handy but they are in the 818 area code 
here in Southern California.

Call me if you want to discuss more details.

Chuck Brummer
(818) 734-4930
[log in to unmask]


______________________________ Reply Separator _________________________________
Subject: Collimation or not?
Author:  [log in to unmask] at ccUnix
Date:    2/20/97 7:59 AM



    \0
   TO:         I4235700 IBMMAIL   IBM Mail exchange

   FROM:       DWALLACE EX2       D.Wallace        - Process Control Mngr
Dunsdale

   DATE:       20 February 1997
   SUBJECT:    Collimation or not?

    I am interested in some user input regarding collimated light 
    source exposure units for imaging multilayer innerlayers. 
    Currently, we use ORC (Japan) point light source units in 
    combination with a glass to glass vacuumed print frame and we are 
    able to achieve very acceptable yields on 100 micron track / gap 
    technology. We wish to improve this capability down to 50 micron 
    track / gap. Is collimation the only practical way of achieving 
    this? Are there any other benefits in using this type of light 
    source? What, if any, are the drawbacks?

    Thanks in advance for any imput.

    David H Wallace Process Control Manager Exacta Circuits Limited.

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