TECHNET Archives

January 1997

TechNet@IPC.ORG

Options: Use Monospaced Font
Show Text Part by Default
Show All Mail Headers

Message: [<< First] [< Prev] [Next >] [Last >>]
Topic: [<< First] [< Prev] [Next >] [Last >>]
Author: [<< First] [< Prev] [Next >] [Last >>]

Print Reply
Subject:
From:
"ddsulliv" <[log in to unmask]>
Date:
Wed, 29 Jan 97 18:01:26 cst
Content-Type:
text/plain
Parts/Attachments:
text/plain (158 lines)
          I agree strongly with Guy's approach below on this or any 
          other process opinion solicitation.  I can guarantee you can 
          find people who have had very positive and very negative 
          experiences with ANY process used to make PWBs.  The 
          approach I always council is that the process has to be 
          right for YOUR SHOP.  So the first thing you need to do is 
          qualify and quantify you situational needs.  If you can get 
          an excellent handle on what you will require from a process, 
          then it becomes easier to chose which process is right for 
          you.
          
          Also, when someone gives you a good recommendation about a 
          process, find out what their situational needs were when 
          they bought into that particular process.  
          
          When someone has had a bad experience, find out their 
          situation as well if you can.  It may very well not apply to 
          YOUR situation.
          
          The suppliers of processes or equipment should be willing to 
          present proof sources for you to quiz.  Take your time 
          talking to these people and find out what they really do 
          with the process or equipment and what they expect from the 
          process or equipment.
          
          Well, that's enough.  My soapbox is getting rickety.
          
          Dave Sullivan
          Rockwell Collins, Inc.
          
          [log in to unmask]


______________________________ Reply Separator _________________________________
Subject: Re: FAB: Horizontal versus vertical etching 
Author:  [log in to unmask] at ccmgw1
Date:    1/29/97 5:27 PM


     This is a very big question.  You will receive a lot of pro's and 
     con's for each process.  (I know I have my opinions) The best thing 
     you can do is decide what you are looking for in a finished etched 
     trace geometry.  Process samples of different line widths and take 
     many cross sections.  When you take your cross sections you will want 
     to cross section both top and bottom (horizontal) / left or right 
     (vertical) of the substrate as it was processed as well as traces that 
     are processed in parallel and perpendicular and at 45 degree angle to 
     the direction of travel of the substrate as it was processed.  When 
     you read these cross sections you will be focused on what the sidewall 
     characteristic is of the left and right side of each trace and how 
     they relate to each other based on direction and position.  With the 
     se cross sections you must also look at the position on the conveyor
      top center bottom on vertical or left center right of a horizont
     al unit.  Once you gather this data you can then determine which pr 
     ocess will meet YOUR expectations.  Include in this decision 
     controlled impedance and very fine lines if this is part of your goal. 
      When you measure the line widths make sure you compare the 
     measurement to the exact location on the A/W that was used to image 
     the test panel.  Line widths on A/W vary and you want to remove this 
     variation from your comparison.  Because each shop's expectations are 
     different each process finds it's own niche.
          
     Guy Willingham
     Zycon
     [log in to unmask]
          
          
______________________________ Reply Separator _________________________________
Subject: FAB: Horizontal versus vertical etching 
Author:  [log in to unmask] at corp
Date:    1/29/97 3:16 AM
          
          
We would like to receive input on the positive and negative aspects 
of horizontal etching with oscillating spray bars, versus vertical 
etching of inner layers and outer layers using an alkaline etchant.
          
We would like to hear of experiences as to which method provides 
the best results in terms of line width uniformity, top to bottom 
consistency, and conveying of cores as thin as .004 with half ounce 
copper on both sides. 
          
Panel sizes vary from 12 X 12 to 21 X 30. Line and spaces down to 
.004 X .004 for the smaller panels, .008 X .008 on the larger panels. 
          
Please presume that equipment of either type is well maintained and 
that the chemistry is under good control. 
          
Many thanks,
          
Luis Rivera
CompuRoute, Inc.
Dallas, TX
[log in to unmask]
(214) 340-0543
          
*************************************************************************** 
* TechNet mail list is provided as a service by IPC using SmartList v3.05 * 
*************************************************************************** 
* To unsubscribe from this list at any time, send a message to:           * 
* [log in to unmask] with <subject: unsubscribe> and no text.        * 
*************************************************************************** 
* If you are having a problem with the IPC TechNet forum please contact   * 
* Dmitriy Sklyar at 847-509-9700 ext. 311 or email at [log in to unmask]      * 
***************************************************************************
          
          
*************************************************************************** 
* TechNet mail list is provided as a service by IPC using SmartList v3.05 * 
*************************************************************************** 
* To unsubscribe from this list at any time, send a message to:           * 
* [log in to unmask] with <subject: unsubscribe> and no text.        * 
*************************************************************************** 
* If you are having a problem with the IPC TechNet forum please contact   * 
* Dmitriy Sklyar at 847-509-9700 ext. 311 or email at [log in to unmask]      * 
***************************************************************************
          

Received: from  by ccmgw1.cacd.rockwell.com (SMTPLINK V2.11)
    ; Wed, 29 Jan 97 17:27:09 cst
Return-Path: <[log in to unmask]>
Received: from stealth.cacd.rockwell.com (stealth) by mailserv with ESMTP
    (1.40.112.8/16.2) id AA143050430; Wed, 29 Jan 1997 17:27:10 -0600
Received: by stealth.cacd.rockwell.com; id RAA15977; Wed, 29 Jan 1997 17:26:34 -0600
Received: from unknown(168.113.24.64) by stealth via smap (V3.1.1)
    id xma015975; Wed, 29 Jan 97 17:26:16 -0600
Received: from ipc.org by simon.ipc.org via SMTP (940816.SGI.8.6.9/940406.SGI)
     id RAA11932; Wed, 29 Jan 1997 17:16:19 -0800
Resent-Date: Wed, 29 Jan 1997 17:16:19 -0800
Received: by ipc.org (Smail3.1.28.1 #2)
    id m0vpfNh-0000ilC; Wed, 29 Jan 97 13:09 CST
Resent-Sender: [log in to unmask]
Old-Return-Path: <[log in to unmask]>
Date: Wed, 29 Jan 97 09:20:45 PST
From: "gwilling" <[log in to unmask]>
Message-Id: <[log in to unmask]>
To: [log in to unmask]
Cc: [log in to unmask], [log in to unmask]
Subject: Re: FAB: Horizontal versus vertical etching 
Resent-Message-Id: <"QbjCP1.0.IZB.M1wxo"@ipc>
Resent-From: [log in to unmask]
X-Mailing-List: <[log in to unmask]> archive/latest/9749
X-Loop: [log in to unmask]
Precedence: list
Resent-Sender: [log in to unmask]

***************************************************************************
* TechNet mail list is provided as a service by IPC using SmartList v3.05 *
***************************************************************************
* To unsubscribe from this list at any time, send a message to:           *
* [log in to unmask] with <subject: unsubscribe> and no text.        *
***************************************************************************
* If you are having a problem with the IPC TechNet forum please contact   *
* Dmitriy Sklyar at 847-509-9700 ext. 311 or email at [log in to unmask]      *
***************************************************************************



ATOM RSS1 RSS2