Has anyone tried to achieve high levels of ionic cleanliness--e.g. 2 to 5 
micrograms per square inch of halides--on dry film solder mask using 
aqueous cleaning with or without saponifier added.  I would be interested 
in specific details of your successes or failures.  

Many seem to be able to achieve such levels with LPI.  If you have tried 
and failed do you have a generally accepted theory explaining why LPI can 
be cleaned more thoroughly without damage to the soldermask.

Thanks to S. Mikell for an enlightening reply to this question asked in a 
slightly different form.    

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