If you're not careful you'll have a lot in common with Hawk Chen.
I've tested various pre-clean processes prior to soldermask (LPI and dry
film)
over the years including:
microetch with persulfate
microetch with peroxide/sulfuric
microetch with peroxymonosulfates
'scotch brite' type scrub
'brushlon' type scrub
'scotch brite' type scrub followed by microetch
microetch followed by Entec CU-56
None compares with pumice scrub for adhesion.
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