DESIGNERCOUNCIL Archives

1996

DesignerCouncil@IPC.ORG

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Subject:
From:
"kevin chen" <[log in to unmask]>
Date:
Thu, 24 Apr 1997 19:02:07 +0800
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text/plain
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Dear sir:
Here is question about photo via process. Does it infringe upon IBM's
patent if we use CIBA-GEIGY or Shipley photo material to develope photovia
process?And may you provide the potential supplier list of the phto
material?



Best Regards
Howard Lin                                                 

                          

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