Brian and Everyone,
Some comments based on 1) my discussions w/Scott Campbell of
Surface Tek Specialty Products re: MEA stripper vapor pressure, and
2) an 8/89 PC Fab article on formaldehyde losses from electroless
plating plus our own stack samples.
MEA stripper losses - MEA vapor pressure is determined by applying
Raoults law, which is Pi(comp) = Xi*Pi(pure) (NOTE: It's tough not
being able to write subscripts.) So to interpret, the vapor pressure of
a dilute component in a solution equals the MOLE fraction of that
component times the vapor pressure of the pure component at the temp.
in question.
Thanks to Scott who supplied a Dow Chemical vapor pressure graph,
and ran the extrapolation below 10 mm Hg (where 100% MEA vapor pressure
is at 163F), the vapor pressure at 130F (typical temp for a stripper)
would be 3.9 mm Hg. Applying Raoults law to a 5% (by wt) solution of
MEA (1.5% molar) would yield an MEA concentration of 0.003% in air. So
if you know your air flow from your stripper, multiplying this by the
weight of air and 0.003% would yield the MEA emissions. This would be
a conservative estimate, as it assumes that the air flow is saturated
with MEA for this operating condition.
Formaldehyde (CH2O) losses - The 8/89 PC Fab article by Dr.
Francesco Tomaiuolo, Alfachimici in Moncalieri, Italy measured the CH2O
concentration in an electroless bath based on 1) a new bath, 2) a
steady bath, and 3) an old bath. What was determined was that the CH2O
loss was driven primarily by the reaction converting CH2O to sodium
formiate and sodium chloride. with CH2O loss to formiate formation at
the 2:1 molar ratio rate. Article concludes that "... in the global
balance consumption, the formaldehyde evaporation is of secondary
importance." Further, "... the solubility of CH2O in an aqueous
solution of electroless copper is extremely high. Therefore, it is
rather difficult to strip it with air bubbling."
HADCO's stack sampling results confirm this report. In 1991
results from our large facility were 0.024 and 0.082 ppm; and from our
quick turn facility 0.008 and 0.001 ppm using OSHA method 52 and NIOSH
method 3500 respectively. Analysis of the higher concentrations using
EPA's stack dispersion modelling confirmed compliance with NH's air
toxic ambient air limits (AALs) at the property lines. Our consultant
concluded that there's more CH2O coming from the exhausts from autos
travelling I93 than from our stacks.
Finally, this data was accepted by the Monterey Bay Unified Air
Polution Control District (MBUAPCD). Although each district has
separate rules, I would think that acceptable scientific data for one
district would be acceptable to another. (P.S. On this account, Scott
Campbell advises that he addressed the MEA issue in the Bay Area about
one year ago!)
Finally, ammonia - This is quite variable based on what etchant
you use, and how you run your etcher. Quantitative sample tubes will
give you a +/- 25% of tube scale concentration for calculating
emissions estimates. But since NH3 is very soluble in water, and its
odor threshold is below the TLV, or STEL, scrubbing it is fairly
inexpensive. My question is why don't board shops scrub this with
muriatic acid to make ammonium chloride for returning to the etcher
since etch rate is a function of chloride concentration and copper
solubility depends on forming a copper-ammonium-choride complex? This
muriatic scrub is what some etch supplier do with spent etch after
raising the pH in an enclosed agitated tank vented to a scrubber. The
resulting NH4Cl solution is then used to make fresh etch.
Hope the above info helps you w/BAAQD. Lee Wilmot
HADCO Corp
From: Brian Thomas [log in to unmask]
Printed Circuit Alliance (PCA)
Sigma Circuits, Inc.
408-727-9168 x 106
408-727-8859 fax
Greetings:
Local area manufacrures in the San Jose, CA area are working on a
cooperative effort with the Bay Area Air Quality Management District
(BAAQMD) developing a permitting handbook and Chapter for the Printed
Circuit Industry. We would anticipate that it will eventually be
adopted for the entire state of California. We are collecting
information regarding emissions from manufacturing processes. Of
particular interest are VOC emissions, either calculations, estimates
or stack measurements. We also need information on other emissions
including acids, formaldehyde, and ammonia.
The most difficult area to resolve at this point are resist
strippers. Current BAAQMD methodology assumes that all of the
organics will be emitted including monoethanolamine.
We plan to include estimated emission rates in the permitting
handbook.
If you have any information that may be of assistance in this effort
please e-mail me or give me a call.
Regards,
Brian Thomas
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