 
| Mime-Version: |
1.0 |
| Content-Type: |
text/plain; charset="us-ascii" |
| Old-Return-Path: |
|
| Date: |
Fri, 26 Apr 1996 15:40:44 +0200 |
| Precedence: |
list |
| Resent-From: |
|
| Resent-Sender: |
|
| X-Status: |
|
| Status: |
O |
| X-Mailing-List: |
|
| X-Sender: |
|
| TO: |
|
| Return-Path: |
<TechNet-request> |
| X-Loop: |
|
| Resent-Message-ID: |
<"ulqY82.0.qgL.R5DWn"@ipc> |
| Subject: |
|
| From: |
|
| From [log in to unmask] Wed May 1 12: |
50:31 1996 |
| Received: |
by ipc.org (Smail3.1.28.1 #2)
id m0uCnhE-000072C; Fri, 26 Apr 96 08:36 CDT |
| X-Mailer: |
Windows Eudora Version 1.4.4 |
| Message-Id: |
|
| Parts/Attachments: |
|
|
Has anyone made a study on how to clean the UV exposure unit's reflectors
in particular on non-collimated + soldermask exposure machines ?
What to do / not do, frequency of cleaning, pros and cons..
- From what we can see, some people are using alcohol iso to clean, but
is it a good solution ? Won't it remove natural protection and enhance
oxydation ?
- Isn't it more suitable to polish, if so with which product ?
We are very concerned because exposure time for Probimer 52 is rather
long (over 120 seconds) on two BASF 60/75 (Probimer 330) and PEPR 2400
(ED Resist) on a PC-130 and a BASF 60/75 using Gallium lamps.
Thank you in advance
Regards, Roland
Roland Jaquet Technical Director
Henri Jaquet SA PCB manufacturer
Geneva Switzerland Prototypes and small qties
tel. xx41-22-794-7878 fx. xx41-22-794-3052
[log in to unmask]
|
|
|
