 
| Received: |
by ipc.org (Smail3.1.28.1 #2)
id m0ve3iq-0000W5C; Sat, 28 Dec 96 12:43 CST |
| Old-Return-Path: |
|
| Date: |
Sat, 28 Dec 1996 13:52:16 -0500 |
| Precedence: |
list |
| Resent-From: |
|
| Resent-Sender: |
|
| From [log in to unmask] Mon Dec 30 09: |
04:26 1996 |
| Status: |
O |
| X-Mailing-List: |
|
| TO: |
|
| Return-Path: |
<TechNet-request> |
| Resent-Message-ID: |
<"ELl1C3.0.BaJ.teMno"@ipc> |
| Subject: |
|
| From: |
|
| X-Status: |
|
| X-Loop: |
|
| Message-ID: |
|
| Parts/Attachments: |
|
|
In a message dated 96-12-27 19:42:46 EST, you write:
> As far as dissolving resist, it all depends on concentration,
> temperature and how long the resist is in contact with the stripping
> solution before it is separated.
>
Also depends a lot on resist stripping chemistry. Generally, the better and
faster the resist stripping chemistry, the more resist is dissolved.
***************************************************************************
* TechNet mail list is provided as a service by IPC using SmartList v3.05 *
***************************************************************************
* To unsubscribe from this list at any time, send a message to: *
* [log in to unmask] with <subject: unsubscribe> and no text. *
***************************************************************************
* If you are having a problem with the IPC TechNet forum please contact *
* Dmitriy Sklyar at 847-509-9700 ext. 311 or email at [log in to unmask] *
***************************************************************************
|
|
|
