TECHNET Archives

1996

TechNet@IPC.ORG

Options: Use Monospaced Font
Show Text Part by Default
Condense Mail Headers

Message: [<< First] [< Prev] [Next >] [Last >>]
Topic: [<< First] [< Prev] [Next >] [Last >>]
Author: [<< First] [< Prev] [Next >] [Last >>]

Print Reply
Received:
by ipc.org (Smail3.1.28.1 #2) id m0uYuC2-0000CXC; Wed, 26 Jun 96 07:59 CDT
From [log in to unmask] Wed Jun 26 13:
32:48 1996
Old-Return-Path:
Date:
Wed, 26 Jun 1996 08:54:36 -0500
Precedence:
list
X-Loop:
Resent-Sender:
TechNet-request [log in to unmask]
X-Status:
Status:
O
X-Mailing-List:
<[log in to unmask]> archive/latest/4852
TO:
Return-Path:
<TechNet-request>
Resent-Message-ID:
<"8x16b.0.IIJ.vGJqn"@ipc>
Subject:
From:
Resent-From:
Message-Id:
Parts/Attachments:
text/plain (13 lines)

     
     I am looking for reference material (articles, books, papers, etc) 
     that specifically discuss plasma etchback processes. Any suggestions ?
     
     Thanks,
     
     D.Drake
     
      



ATOM RSS1 RSS2