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November 2013

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Subject:
From:
Chuck Brummer <[log in to unmask]>
Reply To:
TechNet E-Mail Forum <[log in to unmask]>, [log in to unmask]
Date:
Thu, 14 Nov 2013 09:20:12 -0800
Content-Type:
text/plain
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text/plain (94 lines)
Hi,

I have very successfully used Corona Discharge, a non vacuum form or 
plasma, to clean parts and improve adhesive adhesion.
It creates a fair amount of Ozone while running.

Chuck


Charles W. Brummer | 3M Manufacturing Engineer
3M Electronic Solutions Division
3M Canoga Park, 8357 Canoga Ave. | Canoga Park, CA 91304
Office: 818 734 4930
[log in to unmask] | www.3M.com


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From:   "Neifer, Gebhard" <[log in to unmask]>
To:     <[log in to unmask]>
Date:   11/14/2013 12:48 AM
Subject:        [TN] AW: UV-Ozone Cleaning Processes
Sent by:        TechNet <[log in to unmask]>



Rich,
as far as I know UV-Ozone is not capable to remove inorganic 
contaminations. Plasma on the other hand can remove both, organic and 
inorganic residues...

Gebhard


-----Ursprüngliche Nachricht-----
Von: TechNet [mailto:[log in to unmask]] Im Auftrag von Richard Kraszewski
Gesendet: Mittwoch, 13. November 2013 18:08
An: [log in to unmask]
Betreff: [TN] UV-Ozone Cleaning Processes

Are any of you familiar with UV-Ozone cleaning processes?  I am 
considering using Plasma to clean some PCA's prior to coating to improve 
wetting of coatings, but now wonder if I should also consider UV-Ozone.



Anyone care to state some pros and cons of each for my application?



Suprisingly enough, I don't see any mention of UV-Ozone cleaning in the 
IPC -CH65B handbook.



Thanks

Rich Kraszewski / Plexus





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