Thx. Would be interested to know any CSP, flipchip, etc.
--------------------------
Sent using BlackBerry
From: Inge Hernefjord [mailto:[log in to unmask]]
Sent: Thursday, June 13, 2013 01:59 PM
To: TechNet E-Mail Forum <[log in to unmask]>; Steven Creswick <[log in to unmask]>; Joyce Koo
Subject: Re: [TN] Dropbox
Hi, genious duo,
I had an old US Army report that emphasizes a lot about irradiation of semiconductors. Now, you have to make a distinction between cleaning semiconductors and expose them to natural irradiation as ready products. UV/O2 is a outstanding method of cleaning any substrates, inclusive semiconductor wafers of all kinds, because you get a cleanliness on molecular level. And under controlled processes, the method does not cause any harm to the target.
About semi packages and irradiation, I understand what Juice aim at, namely a exposure to high energy partikels or photons or phonons at such a intensity level that you exceed the band gap levels , equal to a memory I/O status shift. I believe modern packages and semis are radiation hardened for critical applications like for SPACE and others. If you, of some reason, want to clean assembled boards by means of UV/Ozone, nothing will happen.
You can take part of the report under 'Cleaning' and the title is 'UV-Ozone Cleaning of Semiconductor Surfaces'.
Steve, you are welcome to add your antique papers to Dropbox. As I said, most was evaluated decades ago.
Inge
On 13 June 2013 17:28, Steven Creswick <[log in to unmask]<mailto:[log in to unmask]>> wrote:
Joyce,
I am going to send a couple old papers on plasma cleaning to Inge to see if
he will incorporate them into his drop box. They are both 1989 vintage,
essentially back in the olden days of plasma cleaning, so may be of little
specific use, other than generics.
If I get the time I will attempt to search through some of the 1990-2000
ISHM/IMAPs symposiums for more info
?Thought you were on vacation ...?
Steve Creswick
Sr Associate - Balanced Enterprise Solutions
http://www.linkedin.com/in/stevencreswick
616 834 1883<tel:616%20834%201883>
-----Original Message-----
From: TechNet [mailto:[log in to unmask]<mailto:[log in to unmask]>] On Behalf Of Joyce Koo
Sent: Thursday, June 13, 2013 10:22 AM
To: [log in to unmask]<mailto:[log in to unmask]>
Subject: Re: [TN] Dropbox
Inge, any study regarding the potential damage of memory by UV ozone?
Especially, programmables. Thx.
--------------------------
Sent using BlackBerry
----- Original Message -----
From: Inge Hernefjord [mailto:[log in to unmask]<mailto:[log in to unmask]>]
Sent: Thursday, June 13, 2013 09:37 AM
To: [log in to unmask]<mailto:[log in to unmask]> <[log in to unmask]<mailto:[log in to unmask]>>
Subject: [TN] Dropbox
/ Cleaning
added
1. Relative Etch rate in Fluorcarbon Plasmas
2.UV/Ozone Cleaning of Surfaces
3. Very Low Temperature Ashing (VLTA)
Old information, still actual, but hard to find. Most about cleaning was
done more than 20 years ago. The Cyprus guru knows. He has written a good
book that is permanently on my desk.
Inge
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