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June 2013

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Subject:
From:
Inge Hernefjord <[log in to unmask]>
Reply To:
TechNet E-Mail Forum <[log in to unmask]>, Inge Hernefjord <[log in to unmask]>
Date:
Thu, 13 Jun 2013 06:37:51 -0700
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/ Cleaning

added

1. Relative Etch rate in Fluorcarbon Plasmas

2.UV/Ozone Cleaning of Surfaces

3. Very Low Temperature Ashing (VLTA)

Old information, still actual, but hard to find. Most about cleaning was
done more than 20 years ago. The Cyprus guru knows. He has written a good
book that is permanently on my desk.

Inge


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