Any CSP, FlipChip.. etc.....do you know what you are asking
for....man..sorry, dear lady, think you should precize little better,
otherwise Steven will send a truck load...
Inge
On 13 June 2013 20:03, Joyce Koo <[log in to unmask]> wrote:
> Thx. Would be interested to know any CSP, flipchip, etc.
> --------------------------
> Sent using BlackBerry
>
>
> *From*: Inge Hernefjord [mailto:[log in to unmask]]
> *Sent*: Thursday, June 13, 2013 01:59 PM
> *To*: TechNet E-Mail Forum <[log in to unmask]>; Steven Creswick <
> [log in to unmask]>; Joyce Koo
> *Subject*: Re: [TN] Dropbox
>
> Hi, genious duo,
>
> I had an old US Army report that emphasizes a lot about irradiation of
> semiconductors. Now, you have to make a distinction between cleaning
> semiconductors and expose them to natural irradiation as ready products.
> UV/O2 is a outstanding method of cleaning any substrates, inclusive
> semiconductor wafers of all kinds, because you get a cleanliness on
> molecular level. And under controlled processes, the method does not cause
> any harm to the target.
>
> About semi packages and irradiation, I understand what Juice aim at,
> namely a exposure to high energy partikels or photons or phonons at such a
> intensity level that you exceed the band gap levels , equal to a memory
> I/O status shift. I believe modern packages and semis are radiation
> hardened for critical applications like for SPACE and others. If you, of
> some reason, want to clean assembled boards by means of UV/Ozone, nothing
> will happen.
>
> You can take part of the report under 'Cleaning' and the title is
> 'UV-Ozone Cleaning of Semiconductor Surfaces'.
>
> Steve, you are welcome to add your antique papers to Dropbox. As I said,
> most was evaluated decades ago.
>
> Inge
>
>
> On 13 June 2013 17:28, Steven Creswick <[log in to unmask]> wrote:
>
>> Joyce,
>>
>> I am going to send a couple old papers on plasma cleaning to Inge to see
>> if
>> he will incorporate them into his drop box. They are both 1989 vintage,
>> essentially back in the olden days of plasma cleaning, so may be of little
>> specific use, other than generics.
>>
>> If I get the time I will attempt to search through some of the 1990-2000
>> ISHM/IMAPs symposiums for more info
>>
>> ?Thought you were on vacation ...?
>>
>> Steve Creswick
>> Sr Associate - Balanced Enterprise Solutions
>> http://www.linkedin.com/in/stevencreswick
>> 616 834 1883
>>
>>
>>
>> -----Original Message-----
>> From: TechNet [mailto:[log in to unmask]] On Behalf Of Joyce Koo
>> Sent: Thursday, June 13, 2013 10:22 AM
>> To: [log in to unmask]
>> Subject: Re: [TN] Dropbox
>>
>> Inge, any study regarding the potential damage of memory by UV ozone?
>> Especially, programmables. Thx.
>> --------------------------
>> Sent using BlackBerry
>>
>>
>> ----- Original Message -----
>> From: Inge Hernefjord [mailto:[log in to unmask]]
>> Sent: Thursday, June 13, 2013 09:37 AM
>> To: [log in to unmask] <[log in to unmask]>
>> Subject: [TN] Dropbox
>>
>> / Cleaning
>>
>> added
>>
>> 1. Relative Etch rate in Fluorcarbon Plasmas
>>
>> 2.UV/Ozone Cleaning of Surfaces
>>
>> 3. Very Low Temperature Ashing (VLTA)
>>
>> Old information, still actual, but hard to find. Most about cleaning was
>> done more than 20 years ago. The Cyprus guru knows. He has written a good
>> book that is permanently on my desk.
>>
>> Inge
>>
>>
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