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August 2010

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From:
John DeBrita <[log in to unmask]>
Reply To:
TechNet E-Mail Forum <[log in to unmask]>, John DeBrita <[log in to unmask]>
Date:
Mon, 16 Aug 2010 09:41:55 -0700
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This is in addition to the good responses I have seen to this question.
The electrodes need cleaning occasionally to remove the "spikes" that
accumulate on the surfaces. The sparking initiates at those points. I
have also seen low quality Carbon tetra fluoride (CF4) cause sparking.
We use the CF4 in PWB fab. You might not use it in assembly operations.

Regards,

 

John F. DeBrita

Director of Process Engineering

DDi Global Corp.

BUILDING TOMORROW'S TECHNOLOGY ... TODAY

Tel:  714 688-7296  Mobile: 714 944-2214

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-----Original Message-----
From: TechNet [mailto:[log in to unmask]] On Behalf Of Douglas Pauls
Sent: Monday, August 16, 2010 6:07 AM
To: [log in to unmask]
Subject: [BULK] [TN] plasma question
Importance: Low

Good morning all,
For those of you who have used plasma etching on circuit assemblies, I 
have a question.  One of our operators observed "sparking" through the 
plasma chamber viewport and a transistor was fried.  Any idea what
causes 
this?  First time we have seen this.

Doug Pauls

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