Tharaka,
I have never done this and make no claims as to the safety or usefulness of the methods I quickly found on the internet. They all look nasty!
1) BCl3/HBr/Ar plasmas
2) and 3) Chemical etching of sapphire
L. A. Marasina, V. V. Malinovsky, I. G. Pichugin, P. Prentky
V. I. Uljanov (Lenin) Leningrad Electrical Engineering Institute, Leningrad, USSR
Abstract
The results on etching of sapphire substrates with different orientation are discussed. High temperature etching in hydrogen stream and etching in the mixture of H3PO4 and H2SO4 were used in experiments.
4) SF6 plasma
5) Fabrication of wet-etched patterned sapphire substrates for
high-efficiency InGaN/GaN blue light-emitting diodes
C.-L. Wu, M.-H. Lo, Y.-L. Li
Graduate Institute of Photonics and Optoelectronics, National Taiwan University
No. 1, Sec. 4, Roosevelt Road, Taipei, 10617 Taiwan
Y.-C. Chang
Two different etchants were used to
chemically etch the sapphire substrates: H2SO4
and a volume mixture of 3:1 H2SO4:H3PO4. The
sapphire substrates were immersed in the
etchant in a beaker and heated on a hot plate to
an etchant temperature from 260℃ up to 350℃.
6) Fused NaOH/KOH
Bev
RIM
-----Original Message-----
From: TechNet [mailto:[log in to unmask]] On Behalf Of Tharaka Chandanayaka
Sent: Friday, May 21, 2010 4:21 PM
To: [log in to unmask]
Subject: [TN] RE : Sapphire wafer etching
Hi everyone,
I was wondering that anyone came across any methods that can etch Sapphire
wafers in low temperatures. If know please let me know. Tech net is a great
source of information.
Thank you
Tharaka Chandanayaka
[log in to unmask]
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