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January 2009

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Subject:
plasma parameters
From:
ts503 <[log in to unmask]>
Reply To:
[log in to unmask]
Date:
Fri, 30 Jan 2009 15:58:56 +0530
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Dear All,
We have horizontal loading plasma Etch machine.We would like to know the process parameters for the machine to get unifrom etch back effect.
Is the gas mixture recipe & temparature same for the vertical and horizontal loading machines.
Any tips on getting good etch back effect are welcome.The applicaion is for high Tg material more than 170.
Please suggest.
Thanks in advance for your reply.
Regards
Suresh

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Micropack Ltd, Bangalore, India

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